2014³â Ãß°èÇмú´ëȸ
Current Result Document : 1 / 1
ÇѱÛÁ¦¸ñ(Korean Title) |
½Ç¸®ÄÜ ³ª³ë¿ÍÀ̾î MOSFET¡¯sÀÇ Ã¤³Î ±æÀÌ¿Í Æø¿¡ µû¸¥ ¾Æ³¯·Î±× Ư¼º |
¿µ¹®Á¦¸ñ(English Title) |
Silicon Nano wire Gate-all-around SONOS MOSFET¡¯s analog performance by width and length |
ÀúÀÚ(Author) |
±ÇÀçÇù
¼ÁöÈÆ
ÃÖÁøÇü
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Jae-hyup Kwon
Ji-hoon Seo
Jin-hyung Choi
Jong-tae Park
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¿ø¹®¼ö·Ïó(Citation) |
VOL 18 NO. 02 PP. 0773 ~ 0776 (2014. 10) |
Çѱ۳»¿ë (Korean Abstract) |
º» ¿¬±¸¿¡¼´Â ä³Î ±æÀÌ¿Í ÆøÀÇ º¯È¿¡ µû¸¥ ½Ç¸®ÄÜ ³ª³ë¿ÍÀ̾î MOSFET ¼ÒÀÚÀÇ ¾Æ³¯·Î±× Ư¼ºÀ» ºñ±³ ºÐ¼® ÇÏ¿´´Ù. ÃøÁ¤ ¿Âµµ´Â 30¡É, 50¡É, 75¡É, 100¡ÉÀÌ´Ù. »ç¿ëµÈ ¼ÒÀÚÀÇ ÆøÀº 20nm, 30nm, 80nm, 130nm ¿Í ±æÀÌ´Â 250nm, 300nm, 250nm, 500nmÀ» »ç¿ëÇÏ¿´´Ù. ¼ÒÀÚÀÇ ¾Æ³¯·Î±× Ư¼ºÀº À̵¿µµ, Æ®·£½ºÄÁ´öÅϽº, Early Àü¾Ð, Àü¾ÐÀ̵æ, µå·¹ÀÎ Àü·ù ÀÌ´Ù. À̵¿µµ´Â ÆøÀÌ Áõ°¡ÇÔ¿¡ µû¶ó Áõ°¡ÇÏ°í ±æÀÌ¿Í ¿Âµµ°¡ Áõ°¡ÇÒ¼ö·Ï °¨¼ÒÇÑ´Ù. Æ®·£½º ÄÁ´öÅϽº´Â ÆøÀÌ Áõ°¡Çϸé Áõ°¡ÇÑ´Ù. Early Àü¾ÐÀº ±æÀÌ¿Í ¿Âµµ°¡ Áõ°¡ÇÔ¿¡ µû¶ó Áõ°¡ÇÏ°í ÆøÀÌ Áõ°¡ÇÔ¿¡ µû¶ó °¨¼ÒÇÑ´Ù. µû¶ó¼ À̵æÀº ÆøÀÇ °¨¼Ò¿Í ±æÀÌ°¡ Áõ°¡ÇÔ¿¡ µû¶ó Áõ°¡ÇÏ°í ¿Âµµ°¡ Áõ°¡ÇÔ¿¡ µû¶ó °¨¼ÒÇÏ´Â °ÍÀ» ¾Ë ¼ö ÀÖ¾ú´Ù. |
¿µ¹®³»¿ë (English Abstract) |
In this work, analog performances of silicon nanowire MOSFET with different length and channel width have been measured. The channel widths are 20nm, 30nm, 80nm, 130nm and lengths are 250nm, 300nm, 350nm, 500nm. temperatures 30¡É, 50¡É, 75¡É, 100¡É have been measured. The trans-conductance, early voltage, gain, drain current and mobility have been characterized as a function of temperature. The mobility has been enhanced with wider channel width but it has been reduced with longer length and higher temperature. The trans-conductance has been increased with wider channel width. The early voltage has been enhanced with increase of gate length and temperature but it has been reduced with wider width. Therefore, gain has been enhanced with increase of gate longer length and wider width but it has been reduced with higher temperature. |
Å°¿öµå(Keyword) |
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