Çѱ¹Á¤º¸Åë½ÅÇÐȸ ³í¹®Áö (Journal of the Korea Institute of Information and Communication Engineering)
ÇѱÛÁ¦¸ñ(Korean Title) |
ÇÉ Æø¿¡ µû¸¥ ¹®ÅÎÀü¾Ð º¯È¸¦ ÁÙÀ̱â À§ÇÑ ¹«Á¢ÇÕ MuGFET ¼ÒÀÚ¼³°è °¡À̵å¶óÀÎ |
¿µ¹®Á¦¸ñ(English Title) |
Device Design Guideline to Reduce the Threshold Voltage Variation with Fin Width in Junctionless MuGFETs |
ÀúÀÚ(Author) |
À̽¹Î
¹ÚÁ¾ÅÂ
Seung-min Lee
Jong-tae Park
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¿ø¹®¼ö·Ïó(Citation) |
VOL 18 NO. 01 PP. 0135 ~ 0141 (2014. 01) |
Çѱ۳»¿ë (Korean Abstract) |
º» ¿¬±¸¿¡¼´Â ¹«Á¢ÇÕ MuGFETÀÇ ÇÉ Æø¿¡ µû¸¥ ¹®ÅÎÀü¾ÐÀÇ º¯È¸¦ ÁÙÀ̱â À§ÇÑ ¼ÒÀÚ ¼³°è °¡À̵å¶óÀÎÀ» Á¦½ÃÇÏ¿´´Ù. Á¦ÀÛµÈ ¹«Á¢ÇÕ MuGFETÀ¸·ÎºÎÅÍ ÇÉ ÆøÀÌ Áõ°¡ÇÒ¼ö·Ï ¹®ÅÎÀü¾ÐÀÇ º¯È°¡ Áõ°¡ÇÏ´Â °ÍÀ» ¾Ë ¼ö ÀÖ¾ú´Ù. ¹«Á¢ÇÕ MuGFETÀÇ ÇÉ Æø¿¡ µû¸¥ ¹®ÅÎÀü¾ÐÀÇ º¯È¸¦ ÁÙÀ̱â À§ÇÑ ¼ÒÀÚ ¼³°è°¡À̵å¶óÀÎÀ¸·Î °ÔÀÌÆ® À¯Àüü, ½Ç¸®Äܹڸ·ÀÇ µÎ²², ÇÉ ¼ö¸¦ ÃÖÀûÈ ÇÏ´Â ¿¬±¸¸¦ 3Â÷¿ø ¼ÒÀÚ ½Ã¹Ä·¹À̼ÇÀ» ÅëÇØ ¼öÇàÇÏ¿´´Ù. °í À¯ÀüÀ²À» °®´Â La2O3 À¯Àüü¸¦ °ÔÀÌÆ® Àý¿¬ÃþÀ¸·Î »ç¿ëÇϰųª ½Ç¸®ÄÜ ¹Ú¸·À» ÃÖ´ëÇÑ ¾ã°Ô ÇϹǷΠÇÉ ÆøÀÌ Áõ°¡Çصµ ¹®ÅÎÀü¾ÐÀÇ º¯ÈÀ²À» ÁÙÀÏ ¼ö ÀÖÀ½À» ¾Ë ¼ö ÀÖ¾ú´Ù. ƯÈ÷ À¯È¿ ä³Î ÆøÀ» °°°Ô ÇÏ¸é¼ ÇÉ ¼ö¸¦ ¸¹°Ô ÇϹǷΠ¹®ÅÎÀü¾Ð º¯ÈÀ²°ú ¹®ÅÎÀü¾Ð ¾Æ·¡ ±â¿ï±â¸¦ ÀÛ°Ô ÇÏ´Â °ÍÀÌ ¹«Á¢ÇÕ MuGFETÀÇ ÃÖÀûÀÇ ¼ÒÀÚ ¼³°è °¡À̵å¶óÀÎÀÓÀ» ¾Ë ¼ö ÀÖ¾ú´Ù.
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¿µ¹®³»¿ë (English Abstract) |
In this paper, the device design guideline to reduce the threshold voltage variation with fin width in junctionless MuGFET has been suggested. It has been observed that the threshold voltage variation was increased with increase of fin width in junctionless MuGFETs. To reduce the threshold voltage variation with fin width in junctionless MuGFETs, 3-dimensional device simulation with different gate dielectric materials, silicon film thickness, and an optimized fin number has been performed. The simulation results showed that the threshold voltage variation can be reduced by the gate dielectric materials with a high dielectric constant such as La2O3 and the silicon film with ultra-thin thickness even though the fin width is increased. Particularly, the reduction of the threshold voltage variation and the subthreshold slope by reducing the fin width and increasing the fin numbers is known the optimized device design guideline in junctionless MuGFETs.
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Å°¿öµå(Keyword) |
¹«Á¢ÇÕ MuGFET
¹®ÅÎÀü¾Ð º¯È
¹®ÅÎÀü¾Ð ÀÌÇÏ ±â¿ï±â
ÇÉ Æø
°í À¯Àüü
Junctionless MuGFET
threshold voltage variation
subthreshold slope
fin width
high-K dielectrics
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ÆÄÀÏ÷ºÎ |
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