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Ȩ Ȩ > ¿¬±¸¹®Çå > ±¹³» ³í¹®Áö > Çѱ¹Á¤º¸Åë½ÅÇÐȸ ³í¹®Áö (Journal of the Korea Institute of Information and Communication Engineering)

Çѱ¹Á¤º¸Åë½ÅÇÐȸ ³í¹®Áö (Journal of the Korea Institute of Information and Communication Engineering)

Current Result Document : 17 / 20 ÀÌÀü°Ç ÀÌÀü°Ç   ´ÙÀ½°Ç ´ÙÀ½°Ç

ÇѱÛÁ¦¸ñ(Korean Title) ÇÉ Æø¿¡ µû¸¥ ¹®ÅÎÀü¾Ð º¯È­¸¦ ÁÙÀ̱â À§ÇÑ ¹«Á¢ÇÕ MuGFET ¼ÒÀÚ¼³°è °¡À̵å¶óÀÎ
¿µ¹®Á¦¸ñ(English Title) Device Design Guideline to Reduce the Threshold Voltage Variation with Fin Width in Junctionless MuGFETs
ÀúÀÚ(Author) À̽¹Π  ¹ÚÁ¾Å   Seung-min Lee   Jong-tae Park  
¿ø¹®¼ö·Ïó(Citation) VOL 18 NO. 01 PP. 0135 ~ 0141 (2014. 01)
Çѱ۳»¿ë
(Korean Abstract)
º» ¿¬±¸¿¡¼­´Â ¹«Á¢ÇÕ MuGFETÀÇ ÇÉ Æø¿¡ µû¸¥ ¹®ÅÎÀü¾ÐÀÇ º¯È­¸¦ ÁÙÀ̱â À§ÇÑ ¼ÒÀÚ ¼³°è °¡À̵å¶óÀÎÀ» Á¦½ÃÇÏ¿´´Ù. Á¦ÀÛµÈ ¹«Á¢ÇÕ MuGFETÀ¸·ÎºÎÅÍ ÇÉ ÆøÀÌ Áõ°¡ÇÒ¼ö·Ï ¹®ÅÎÀü¾ÐÀÇ º¯È­°¡ Áõ°¡ÇÏ´Â °ÍÀ» ¾Ë ¼ö ÀÖ¾ú´Ù. ¹«Á¢ÇÕ MuGFETÀÇ ÇÉ Æø¿¡ µû¸¥ ¹®ÅÎÀü¾ÐÀÇ º¯È­¸¦ ÁÙÀ̱â À§ÇÑ ¼ÒÀÚ ¼³°è°¡À̵å¶óÀÎÀ¸·Î °ÔÀÌÆ® À¯Àüü, ½Ç¸®Äܹڸ·ÀÇ µÎ²², ÇÉ ¼ö¸¦ ÃÖÀûÈ­ ÇÏ´Â ¿¬±¸¸¦ 3Â÷¿ø ¼ÒÀÚ ½Ã¹Ä·¹À̼ÇÀ» ÅëÇØ ¼öÇàÇÏ¿´´Ù. °í À¯ÀüÀ²À» °®´Â La2O3 À¯Àüü¸¦ °ÔÀÌÆ® Àý¿¬ÃþÀ¸·Î »ç¿ëÇϰųª ½Ç¸®ÄÜ ¹Ú¸·À» ÃÖ´ëÇÑ ¾ã°Ô ÇϹǷΠÇÉ ÆøÀÌ Áõ°¡Çصµ ¹®ÅÎÀü¾ÐÀÇ º¯È­À²À» ÁÙÀÏ ¼ö ÀÖÀ½À» ¾Ë ¼ö ÀÖ¾ú´Ù. ƯÈ÷ À¯È¿ ä³Î ÆøÀ» °°°Ô Çϸ鼭 ÇÉ ¼ö¸¦ ¸¹°Ô ÇϹǷΠ¹®ÅÎÀü¾Ð º¯È­À²°ú ¹®ÅÎÀü¾Ð ¾Æ·¡ ±â¿ï±â¸¦ ÀÛ°Ô ÇÏ´Â °ÍÀÌ ¹«Á¢ÇÕ MuGFETÀÇ ÃÖÀûÀÇ ¼ÒÀÚ ¼³°è °¡À̵å¶óÀÎÀÓÀ» ¾Ë ¼ö ÀÖ¾ú´Ù.
¿µ¹®³»¿ë
(English Abstract)
In this paper, the device design guideline to reduce the threshold voltage variation with fin width in junctionless MuGFET has been suggested. It has been observed that the threshold voltage variation was increased with increase of fin width in junctionless MuGFETs. To reduce the threshold voltage variation with fin width in junctionless MuGFETs, 3-dimensional device simulation with different gate dielectric materials, silicon film thickness, and an optimized fin number has been performed. The simulation results showed that the threshold voltage variation can be reduced by the gate dielectric materials with a high dielectric constant such as La2O3 and the silicon film with ultra-thin thickness even though the fin width is increased. Particularly, the reduction of the threshold voltage variation and the subthreshold slope by reducing the fin width and increasing the fin numbers is known the optimized device design guideline in junctionless MuGFETs.
Å°¿öµå(Keyword) ¹«Á¢ÇÕ MuGFET   ¹®ÅÎÀü¾Ð º¯È­   ¹®ÅÎÀü¾Ð ÀÌÇÏ ±â¿ï±â   ÇÉ Æø   °í À¯Àüü   Junctionless MuGFET   threshold voltage variation   subthreshold slope   fin width   high-K dielectrics  
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