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Çмú´ëȸ ÇÁ·Î½Ãµù

Ȩ Ȩ > ¿¬±¸¹®Çå > Çмú´ëȸ ÇÁ·Î½Ãµù > Çѱ¹Á¤º¸Åë½ÅÇÐȸ Çмú´ëȸ > 2008³â Ãß°èÇмú´ëȸ

2008³â Ãß°èÇмú´ëȸ

Current Result Document :

ÇѱÛÁ¦¸ñ(Korean Title) High-Q Factor ZnO-based Film Bulk Acoustic Resonator Devices
¿µ¹®Á¦¸ñ(English Title) High-Q Factor ZnO-based Film Bulk Acoustic Resonator Devices
ÀúÀÚ(Author) Giwan Yoon   Linh Mai  
¿ø¹®¼ö·Ïó(Citation) VOL 12 NO. 02 PP. 0061 ~ 0065 (2008. 10)
Çѱ۳»¿ë
(Korean Abstract)
¿µ¹®³»¿ë
(English Abstract)
In this paper, we studied a ZnO-based film bulk acoustic resonator (FBAR) device fabricated on a specially designed multi-layerd Bragg reflector part. Very thin chromium adhesion layers (0,03um thick) were additionally deposited to improve the quality of the Bragg reflector and some thermal treatments were performed to improve the resonant characteristics of the device. At the operating frequency of ~2.7GHz, excellent resonant characteristics were observed in terms of return loss and quality factor, and effective electromechanical coupling coefficient. These findings are expected to be highly promising and effective for improving the performance of the FBAR devices at high frequency.
Å°¿öµå(Keyword) Resonator   FBAR device   Thermal annealing   Adhesion  
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